Substrate Preclean

Available from Anatech USA
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Plasma process is essential for substrate precleaning at the molecular level. No matter how many rinse steps are used after wet cleaning, some residue remains that can interfere with adherence between the substrate and adhesives, paints, and bonding of other materials. Inductively Coupled Plasma (ICP) produces an isotropic plasma that engulfs the part in active plasma removing organic contaminants.

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