Anatech USA
About Anatech USA
Anatech USA delivers high vacuum systems with graphic state-of-the-art, "Touch-Panel" intuitive control packages. Every effort is made to tailor the system to meet your needs and budget requirements.
Thin Film Deposition equipment for metals and dielectrics, using Planar Magnetron sources powered by DC and/or RF supplies. Electron Beam and Thermal Resistance source systems are also available.
Gas Plasma vacuum systems with quartz or aluminum chambers. Systems are designed to clean at the molecular level, activate surfaces or etch surfaces.
Anatech USA works to deliver systems with consistent value and quality that meet or exceed our customer's expectations.
Competitors of Anatech USA
Ever felt lost in the complex world of surface science? You’re not alone. At Droplet Lab, we’ve dedicated ourselves to bridging this gap, making surface science simple and accessible for everyone involved. Our motto? Surface Science Simplified. Read More
Sprinter Marking manufactures a range of machines models that automatically ink code-mark message sizes up to 2 square inches on a wide range of porous and non-porous surfaces. These machines are very small in physical size, yet are built for rugged industrial operation and are capable of high... Read More
3DT manufactures corona and plasma surface treatment systems designed to solve adhesion problems by increasing the surface tension on substrates and, thereby, greatly improving bonding for your printing, coating, laminating, adhesive and micro cleaning applications. 3DT’s standard and custom... Read More
Products by Anatech USA
By Anatech USA
A Gas Plasma may form whenever gas is exposed to an electric field. If the field is sufficiently strong, a high percentage of gas atoms will surrender an electron or two and become ionized. The resultant ionized gas and liberated energetic electrons comprise the gas plasma or plasma. The ionized... Read more »
By Anatech USA
Plasma process is essential for substrate precleaning at the molecular level. No matter how many rinse steps are used after wet cleaning, some residue remains that can interfere with adherence between the substrate and adhesives, paints, and bonding of other materials. Inductively Coupled Plasma... Read more »
By Anatech USA
Plasma Cleaning: Essential for substrate precleaning at the molecular level. No matter how many rinse steps are used after wet cleaning, some residue remains that can interfere with adherence between the substrate and adhesives, paints, inks, potting compound and bonding of other... Read more »
